Daikichi Awamura

Wafer Pattern Defect Detection: An Automatic Inspection Technique

Yasushi Uchiyama, Daikichi Awamura, Katsuyoshi Nakashima, 1983, Advanced Lithography.

Performance of i- and g-line phase-shift measurement system MPM-100

Hiroshi Fujita, Hisatake Sano, Takahiro Ode, 1996, Photomask and Next Generation Lithography Mask Technology.

Direct phase-shift measurement with transmitted deep-UV illumination

Takahiro Ode, Haruhiko Kusunose, Daikichi Awamura, 1996, Photomask and Next Generation Lithography Mask Technology.

Side-looking confocal microscope

Takahiro Ode, Satoshi Komiya, Daikichi Awamura, 1990, Other Conferences.

Reticle Inspection Technology To Compare The Pattern Against Data

Daikichi Awamura, 1982, Advanced Lithography.

Evaluation results of the novel reticle pattern defect inspection system for 1-Gb device

Kenichi Kobayashi, Yasunori Hada, Takayoshi Matsuyama, 1997, Photomask and Next Generation Lithography Mask Technology.

Novel inspection system with design rule check for high-accuracy reticles

Kenichi Kobayashi, Yasunori Hada, Takayoshi Matsuyama, 1999, Photomask and Next Generation Lithography Mask Technology.

Transmittance measurement with interferometer system

Takahiro Ode, Haruhiko Kusunose, Daikichi Awamura, 1996, Photomask and Next Generation Lithography Mask Technology.