Cyrus Emil Tabery

Optical lithography simulation and photoresist optimization for photomask fabrication

Clifford L. Henderson, C. Grant Willson, Steven Scheer, 1999, Advanced Lithography.

Simulation-based formulation of a nonchemically amplified resist for 257-nm laser mask fabrication

C. Grant Willson, Benjamen M. Rathsack, Cyrus Emil Tabery, 2000, Advanced Lithography.

Lithography simulation of sub-0.30-μm resist features for photomask fabrication using i-line optical pattern generators

C. Grant Willson, Benjamen M. Rathsack, Cyrus Emil Tabery, 1999, Photomask Technology.