Cecilia E. Philbin

Optical lithography simulation and photoresist optimization for photomask fabrication

Clifford L. Henderson, C. Grant Willson, Steven Scheer, 1999, Advanced Lithography.

Model-based OPC methodology for 0.13 micron technology

Sejal N. Chheda, Vishnu G. Kamat, Bill Wilkinson, 2002, SPIE Photomask Technology.

ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

Christopher A. Spence, Greg P. Hughes, Robert K. Henderson, 2002, SPIE Photomask Technology.

Lithography simulation of sub-0.30-μm resist features for photomask fabrication using i-line optical pattern generators

C. Grant Willson, Benjamen M. Rathsack, Cyrus Emil Tabery, 1999, Photomask Technology.