Yalin Xiong

Energy Flux Method for Die-to-Database Inspection of Critical Layer Reticles

Lantian Wang, Zongchang Yu, William Volk, 2002, Photomask Technology.

High resolution inspection with wafer plane die: database defect detection

Carl Hess, Yalin Xiong, Mark J. Wihl, 2008, Photomask Technology.

Wafer plane inspection with soft resist thresholding

Carl Hess, Yalin Xiong, Mark J. Wihl, 2008, Photomask Technology.

A novel approach: high resolution inspection with wafer plane defect detection

Carl Hess, Yalin Xiong, Mark J. Wihl, 2008, Photomask Japan.

Energy flux method for inspection of contact and VIA layer reticles

Lantian Wang, Zongchang Yu, William Volk, 2003, SPIE Advanced Lithography.

Extending a 193 nm mask inspector for 22 nm HP EUV mask inspection

Qiang Zhang, Gregg Inderhees, Yalin Xiong, 2010, Photomask Technology.