S. Mohajerzadeh

发表

High‐Performance Phosphorene‐Based Transistors Using a Novel Exfoliation‐Free Direct Crystallization on Silicon Substrates

S. Rajabali, Mehrnaz Esfandiari, Shams Mohajerzadeh, 2020, Advanced Materials Interfaces.

Enhanced UV-assisted vertical etching of polyethylene terephthalate for fabrication of microsystems

H. Pajouhi, A. Sadeghi, A. Jahanshahi, 2009 .

High aspect ratio hydrogenation-assisted lateral etching of (1 0 0) silicon substrates

J. Nilchi, M. Kayyalha, S. Mohajerzadeh, 2011 .

Highly patterned growth of SnO2 nanowires using a sub-atmospheric vapor–liquid–solid deposition

M. Akbari, S. Mohajerzadeh, 2017 .

Vertically etched silicon nano-rods as a sensitive electron detector

S. Soleimani-Amiri, A. Shahsafi, M. Hajmirzaheydarali, 2015 .

Structural improvement of amorphous silicon using metal-induced crystallization

A. Khakifirooz, S. Mohajerzadeh, S. Haji, 2000, ICM 2000. Proceedings of the 12th International Conference on Microelectronics. (IEEE Cat. No.00EX453).

Graphene decorated microelectrodes for simultaneous detection of ascorbic, dopamine, and folic acids by means of chemical vapor deposition

F. Nayeri, Azam Gholizadeh, N. Namdar, 2015 .

Lateral plasma display panels suitable for fabrication on flexible substrates

A. Akhavan, A. Goodarzi, S. Mohajerzadeh, 2001, ICM 2001 Proceedings. The 13th International Conference on Microelectronics..

A novel non-sequential hydrogen-pulsed deep reactive ion etching of silicon

E. Asl-Soleimani, A. Sandoughsaz, M. Gharooni, 2013 .

Facile and rapid exfoliation of black phosphorus assisted by acetic acid

E. Akbarnejad, S. Mohajerzadeh, F. Salehi, 2022, Journal of Materials Science: Materials in Electronics.

High aspect ratio micro- and nano-machining of silicon using time-multiplexed reactive ion etching

Z. Sanaee, M. Abdolahad, M. Poudineh, 2011 .

Modeling of spatial growth of SnO2 nanowires on silicon substrates by VLS technique

S. Kamaei, M. Mohajerzadeh, M. Akbari, 2019, Materials Research Express.

Effect of Pressure on Morphology of the Grown Layers of Carbon Nanotubes by Modified Plasma‐Enhanced Chemical Vapor Deposition

S. Mohajerzadeh, A. Khodadadi, H. Hesamzadeh, 2005 .

Micro-machining of [100] Si using a novel ultra-violet induced anisotropic etching in HNA solution

S. Haji, K. Zandi, S. Mohajerzadeh, 2001, ICM 2001 Proceedings. The 13th International Conference on Microelectronics..

Realization of complex three-dimensional free-standing structures on silicon substrates using controllable underetching in a deep reactive ion etching

S. Azimi, A. Sandoughsaz, H. Mazreati, 2013 .