K. Fukuda

Growth of Amorphous and Crystalline Silicon by HR-CVD (Hydrogen Radical Enhanced CVD)

J. Hanna, S. Oda, I. Shimizu, 1987 .

Preparation of a-Si and its Related Materials by Hydrogen Radical Enhanced CVD

J. Hanna, S. Oda, I. Shimizu, 1987 .

The Role of Hydrogen Radicals in the Growth of a-Si and Related Alloys

J. Hanna, H. Shirai, S. Oda, 1986 .

a‐SI TFTS with Stacked Gate Insulator of CVD‐SiO2/PECVD‐SiNx

N. Ibaraki, K. Fukuda, 1993 .

A new a-Si TFT with SiO2/SiN/sub x/ gate insulator for 10.4-inch LCDs

N. Ibaraki, K. Fukuda, H. Toeda, 1991, Conference Record of the 1991 International Display Research Conference.

Reactive Deposition of a-Silicon and Si-Based Alloys

H. Shibata, J. Hanna, H. Shirai, 1986 .

Properties of a-SiN0.7:H Films in High Electric Field

K. Maeda, N. Ibaraki, K. Fukuda, 1989 .

Preparation of Polycrystalline Silicon by Hydrogen-Radical-Enhanced Chemical Vapor Deposition

J. Hanna, S. Oda, I. Shimizu, 1987 .

The effect of interface states on amorphous-silicon transistors

N. Ibaraki, K. Fukuda, H. Takata, 1989 .