Han-ku Cho

发表

Implementation of a robust virtual metrology for plasma etching through effective variable selection and recursive update technology

Thomas F. Edgar, Chonghun Han, Han-Ku Cho, 2014 .

Effects of various plasma pretreatments on 193 nm photoresist and linewidth roughness after etching

Han-Ku Cho, Denis Shamiryan, Werner Boullart, 2006 .

An effective procedure for sensor variable selection and utilization in plasma etching for semiconductor manufacturing

Chonghun Han, Thomas F. Edgar, Kiwook Song, 2014, Comput. Chem. Eng..

Study of plasma charging-induced white pixel defect increase in CMOS active pixel sensor

Han-Ku Cho, Joo-Tae Moon, Chang-Jin Kang, 2007 .

Effective Carbon Contaminant Cleaning Condition Using Ozone Dissolved Water and Megasonic for Ru-Capped Extreme Ultraviolet Lithography Mask

Han-Ku Cho, Seung-Ho Lee, Jinho Ahn, 2012 .

Etching characteristics and modeling for oval-shaped contact

J. Moon, Sung‐Chan Park, C. Kang, 2007 .

Predicting conversion time of circuit design file by artificial neural networks

Ji-Hyeon Choi, Han-Ku Cho, Jee-Hyong Lee, 2008, SPIE Advanced Lithography.

Rigorous modeling and analysis of impact produced by microstructures in mask on wafer pattern fidelity

Han-Ku Cho, Hee-Bom Kim, Byung-Gook Kim, 2008, SPIE Advanced Lithography.

Fast simulation of stochastic exposure distribution in electron-beam lithography

Han-Ku Cho, Byung-Gook Kim, Xinyu Zhao, 2012 .

Chamber maintenance and fault detection technique for a gate etch process via self-excited electron resonance spectroscopy

Han-Ku Cho, Chang-Jin Kang, Young-Jae Jung, 2005 .

Substrate temperature effects on 193nm photoresist deformation and self-aligned contact hole etching performances

Han-Ku Cho, Myeong-cheol Kim, C. Kang, 2006 .

Scatterometry based profile metrology of two-dimensional patterns of EUV masks

Han-Ku Cho, Hee-Bom Kim, Byung-Gook Kim, 2007, Photomask Japan.

Image analysis of alignment and overlay marks with compound structure

Han-Ku Cho, Joo-Tae Moon, Seong-Sue Kim, 2007, SPIE Advanced Lithography.

Simulation of critical dimension and profile metrology based on scatterometry method

Han-Ku Cho, Joo-Tae Moon, Irina Pundaleva, 2006, SPIE Photomask Technology.

Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Han-Ku Cho, Joo-Tae Moon, Sang-Gyun Woo, 2005, SPIE Advanced Lithography.

Defect printability and defect inspection simulations of patterned EUVL mask using rigorous coupled-wave analysis

Han-Ku Cho, Sang-Gyun Woo, Seong-Sue Kim, 2005, SPIE Advanced Lithography.

Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Han-Ku Cho, Joo-Tae Moon, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Determination of the CD performance and carbon contamination of an EUV mask by using a coherent scattering microscopy/in-situ contamination system

Sangsul Lee, Dong-gun Lee, Seong-Sue Kim, 2010 .

Angular Dependence of the Etch Rates of TaN in CF4/Ar and CHF3/Ar Plasmas

Sungmin Huh, Han-Ku Cho, Sang Heup Moon, 2008 .

Impact of registration error of reticle on total overlay error budget

Han-Ku Cho, Joo-Tae Moon, Doo-Youl Lee, 2006 .

Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography

Han-Ku Cho, Hye-Keun Oh, Joon-Min Park, 2009, Advanced Lithography.

Line edge and width roughness dependency on each ingredient of extreme ultraviolet molecular resist

Han-Ku Cho, Hye-Keun Oh, In Wook Cho, 2009, Advanced Lithography.

Quantitative Evaluation of Grid Size Effect on Critical Dimension Uniformity Improvement

Doo-Youl Lee, W. Han, Jung-Hyeon Lee, 2004 .

Comprehensive analysis of sources of total CD variation in ArF resist perspective

Han-Ku Cho, Woo-Sung Han, Sang-Gyun Woo, 2004, SPIE Advanced Lithography.