K. Park

DEVELOPMENT OF ENDPOINT DETECTION ALGORITHM IN THE MULTI-STEP PLASMA ETCHING PROCESS

Kyounghoon P. Han, H. Chae, Chonghun Han, 2007 .

Humidity sensitive field effect transistors

S. P. Lee, Kun-Joo Park, Sung Pil Lee, 1996 .

Principal Component Analysis Based Support Vector Machine for the End Point Detection of the Metal Etch Process

En Sup Yoon, Heeyeop Chae, Kyounghoon P. Han, 2008 .

Real-Time End-Point Detection Using Modified Principal Component Analysis for Small Open Area SiO2 Plasma Etching

En Sup Yoon, Heeyeop Chae, Kyounghoon P. Han, 2008 .

Multi-way principal component analysis for the endpoint detection of the metal etch process using the whole optical emission spectra

En Sup Yoon, Heeyeop Chae, Kyounghoon P. Han, 2008 .