Kouta Nishino

Development of EUV resist for 22nm half pitch and beyond

Kentaro Goto, Ken Maruyama, Shalini Sharma, 2011, Advanced Lithography.

Development of EUV resist for 22nm half pitch and beyond

Kentaro Goto, Makoto Shimizu, Ken Maruyama, 2010, Advanced Lithography.

JSR EUV Resist Development toward 22nmhp Design and Beyond

Makoto Shimizu, Ken Maruyama, Kouta Nishino, 2010 .