Kiyohiko Matsudo

In situ substrate‐surface cleaning for very low temperature silicon epitaxy by low‐kinetic‐energy particle bombardment

Tadahiro Ohmi, Hiroshi Iwabuchi, Takeshi Ichikawa, 1988 .

Low-temperature silicon epitaxy by low-energy bias sputtering

Tadahiro Ohmi, Hiroshi Iwabuchi, Takeshi Ichikawa, 1988 .

Very-Low-Temperature Epitaxial Silicon Growth By Low-Kinetic-Energy Particle Bombardment

T. Shibata, T. Ohmi, T. Ichikawa, 1988 .