M. Chauhan

发表

Macrocycle Network-Aided Nanopatterning of Inorganic Resists on Silicon

K. Gonsalves, Sunil Kumar, S. Sharma, 2022, ACS Applied Nano Materials.

A Modified Source Impact Ionisation MOSFET (MS I-MOS) for Low Power and Fast Switching Digital Applications

R. Chauhan, M. Chauhan, 2018 .

Analysis of gate tunnelling currents in nanoscale metal—oxide—semiconductor field effect transistors (MOSFETs) with SiO2 and high-K gate dielectrics

M. Singh, G. Joshi, M. Chauhan, 2009 .

Development of Nickel-based Negative Tone Metal-Oxide Clusters Resist for sub-10 nm Electron Beam and Helium Ion Beam Lithography.

K. Gonsalves, Rudra Kumar, S. Sharma, 2020, ACS applied materials & interfaces.

Resists for Helium Ion Beam Lithography: Recent Advances

K. Gonsalves, S. Ghosh, S. Sharma, 2020 .

Induced Chemical Networking of Organometallic Tin in a Cyclic Framework for Sub-10 nm Patterning and Interconnect Application

K. Gonsalves, Sunil Kumar, S. Sharma, 2023, ACS Applied Nano Materials.

Performance analysis of junction-less double Gate n-p-n impact ionization MOS transistor (JLDG n-IMOS)

R. Chauhan, M. Chauhan, 2018 .

Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning

K. Gonsalves, S. Ghosh, S. Sharma, 2021 .

Ultrasensitive metal-organic cluster resist for patterning of single exposure high numerical aperture extreme ultraviolet lithography applications

K. Gonsalves, S. Sharma, Sumit Choudhary, 2022, Journal of Micro/Nanopatterning, Materials, and Metrology.

All-new nickel-based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning

Satinder K. Sharma, Kenneth E. Gonsalves, Rudra Kumar, 2020, Advanced Lithography.