Prashant Kumar Kulshreshtha

Nanoscale modulus and surface chemistry characterization for collapse free resists

James M. Blackwell, Dominik Ziegler, Ken Maruyama, 2013, Advanced Lithography.

Revealing beam-induced chemistry using modulus mapping in negative-tone EUV/e-beam resists with and without cross-linker additives

Weilun Chao, Scott Dhuey, Deirdre L. Olynick, 2015, Advanced Lithography.