H. Goto

A low damage, low contaminant plasma processing system utilizing energy clean technology

Tadashi Shibata, Tadahiro Ohmi, Osamu Kamiya, 1991 .

Dual excitation reactive ion etcher for low energy plasma processing

Tadahiro Ohmi, T. Ohmi, H. H. Goto, 1992 .

Independent control of ion density and ion bombardment energy in a dual RF excitation plasma

Tadahiro Ohmi, T. Ohmi, H. H. Goto, 1993 .

Control of ion energy and flux in a dual radio frequency excitation magnetron sputtering discharge

Tadahiro Ohmi, T. Ohmi, H. H. Goto, 1991 .

A proposed magnetically enhanced reactive ion etcher for ULSI

Tadahiro Ohmi, S. G. Newberry, T. Ohmi, 1992 .