Philippe Leray

发表

Towards manufacturing a 10nm node device with complementary EUV lithography

Jan V. Hermans, Huixiong Dai, Ardavan Niroomand, 2013, Advanced Lithography.

Cluster optimization to improve CD control as an enabler for double patterning

David Laidler, Philippe Leray, Len Tedeschi, 2008, Lithography Asia.

Accelerating on-device overlay metrology accuracy verification

Sandip Halder, Philippe Leray, Shimon Levi, 2020, Advanced Lithography.

Immersion effects on lithography system performance

David Laidler, Philippe Leray, Shaunee Cheng, 2006, SPIE Advanced Lithography.

Bayesian networks in materials science: new tools to predict the properties of materials

Philippe Leray, Franck Tancret, Edern Menou, 2014 .

3D features measurement using YieldStar, an angle resolved polarized scatterometer

Peter Vanoppen, Philippe Leray, Shaunee Cheng, 2011, Advanced Lithography.

SemCaDo: a serendipitous strategy for managing the crossing-over between the causal discovery and the ontology evolution.

Philippe Leray, Nahla Ben Amor, Montassar Ben Messaoud, 2014 .

Comprehensive approach to MuGFET metrology

Rita Rooyackers, Philippe Leray, Shaunee Cheng, 2006, SPIE Advanced Lithography.

Multi layer overlay measurement recent developments

Philippe Leray, Inna Tarshish-Shapir, Nimrod Shuall, 2013, Advanced Lithography.

Accuracy assessment between on-product and on-optical-target overlay metrology with SEM and STEM

Sandip Halder, Philippe Leray, Shimon Levi, 2020 .

Analyze line roughness sources using power spectral density (PSD)

Wei Fang, Philippe Leray, Lingling Pu, 2019, Advanced Lithography.

High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification

Philippe Leray, Vidyasagar Anantha, Raghav Babulnath, 2020, Photomask Technology.

Overlay metrology solutions in a triple patterning scheme

Ming Mao, Philippe Leray, Bart Baudemprez, 2015, Advanced Lithography.

Overlay accuracy with respect to device scaling

David Laidler, Philippe Leray, Shaunee Cheng, 2012, Advanced Lithography.

Diffraction based overlay re-assessed

David Laidler, Philippe Leray, Shaunee Cheng, 2011, Advanced Lithography.

Improving scanner wafer alignment performance by target optimization

Sudhar Raghunathan, Philippe Leray, Robert John Socha, 2016, SPIE Advanced Lithography.

Overlay error investigation for metal containing resist

Ming Mao, Philippe Leray, Dieter Van Den Heuvel, 2019 .

Hybrid overlay metrology with CDSEM in a BEOL patterning scheme

Philippe Leray, Yutaka Okagawa, Osamu Inoue, 2015, Advanced Lithography.

On product overlay metrology challenges in advanced nodes

Philippe Leray, Roel Gronheid, Efi Megged, 2020, Advanced Lithography.

Track optimization and control for 32nm node double patterning and beyond

David Laidler, Philippe Leray, Len Tedeschi, 2009, Advanced Lithography.

A single metrology tool solution for complete exposure tool setup

Peter Vanoppen, David Laidler, Philippe Leray, 2010, Advanced Lithography.

Real-time inspection system utilizing scatterometry pupil data

Costas J. Spanos, Philippe Leray, Anne-Laure Charley, 2014 .

Scatterometry metrology validation with respect to process control

David Laidler, Philippe Leray, Shaunee Cheng, 2010, Advanced Lithography.

Sources of overlay error in double patterning integration schemes

David Laidler, Philippe Leray, Shaunee Cheng, 2008, SPIE Advanced Lithography.

Focus and dose deconvolution technique for improved CD control of immersion clusters

Peter Vanoppen, David Laidler, Philippe Leray, 2010, Advanced Lithography.

Massive metrology of 2D logic patterns on BEOL EUVL

Kotaro Maruyama, Yuichiro Yamazaki, Sayantan Das, 2020, Advanced Lithography.

Scatterometry and AFM measurement combination for area selective deposition process characterization

Philippe Leray, Avron Ger, Roy Koret, 2019, Advanced Lithography.