Zsolt Tokei

Electrical evaluation and TEM/SEm investigation of a bottomless I-PVD Ta(N) barrier in a damascene architecture

Karen Maex, Hugo Bender, Gerald Beyer, 2000 .

Reliability challenges for copper low-k dielectrics and copper diffusion barriers

Zsolt Tokei, Y.-L. Li, G. P. Beyer, 2005, Microelectron. Reliab..

As-grown donor-like traps in low-k dielectrics and their impact on intrinsic TDDB reliability

Robin Degraeve, Ingrid De Wolf, Y. Barbarin, 2014, Microelectron. Reliab..

Metal reliability mechanisms in Ruthenium interconnects

Christopher J. Wilson, Michele Stucchi, Zsolt Tokei, 2020, 2020 IEEE International Reliability Physics Symposium (IRPS).

Dielectric Reliability Study of 21 nm Pitch Interconnects with Barrierless Ru Fill

Christopher J. Wilson, Kris Croes, Alicja Lesniewska, 2020, 2020 IEEE International Reliability Physics Symposium (IRPS).

Layout dependency induced deviation from Poisson area scaling in BEOL dielectric reliability

Guido Groeseneken, Zsolt Tokei, Karen Maex, 2005, Microelectron. Reliab..

Continued scalability of copper/low-k interconnects

Karen Maex, Wenqi Zhang, Kris Vanstreels, 2005 .

Low-Frequency Noise Measurements to Characterize Cu-Electromigration Down to 44nm Metal Pitch

Ingrid De Wolf, Zsolt Tokei, Kristof Croes, 2019, 2019 IEEE International Reliability Physics Symposium (IRPS).