Hiroshi Shiraishi

发表

Improvement of the resolution and accuracy of chemical-amplification positive resist for 0.13-μm reticle fabrication

Morihisa Hoga, Tadashi Arai, Takashi Soga, 2000, Photomask Japan.

Image recording material and image recording method thus

Nobuaki Hayashi, Hiroshi Shiraishi, Takumi Ueno, 1990 .

Chemical amplification negative resist systems composed of novolac, silanols, and acid generators

Nobuaki Hayashi, Hiroshi Shiraishi, Emiko Fukuma, 1990, Advanced Lithography.

Microswelling-free negative resists for ArF excimer laser lithography utilizing acid-catalyzed intramolecular esterification

Yuko Tsuchiya, Takashi Hattori, Atsuko Yamaguchi, 1999, Advanced Lithography.

Contrast-boosted resist using a polarity-change reaction during aqueous base development

Jiro Yamamoto, Fumio Murai, Hiroshi Shiraishi, 1996, Advanced Lithography.

Azide-Phenolic Resin Resists Sensitive To Visible Light

Hiroshi Shiraishi, Takao Iwayanagi, Michiaki Hashimoto, 1985, Advanced Lithography.

Active filter system containing an inverter bypass circuit to suppress harmonic resonance

Ikeda Haruo, Ikuo Kawaguchi, Yoshiya Ogihara, 1994 .

Negative resists for electron-beam lithography utilizing acid-catalyzed intramolecular dehydration of phenylcarbinol

Jiro Yamamoto, Hiroshi Shiraishi, Takumi Ueno, 1996, Advanced Lithography.

Surface and line-edge roughness in acid-breakable resin-based positive resist

Toshio Sakamizu, Hiroshi Shiraishi, 2003, SPIE Advanced Lithography.

Acid diffusion control in chemical amplification positive resists by exchange reaction of conjugate bases

Tadashi Arai, Toshio Sakamizu, Hiroshi Shiraishi, 1997, Advanced Lithography.

Polyvinylphenols protected with tetrahydropyranyl group in chemical amplification positive deep-UV resist systems

Nobuaki Hayashi, Hiroshi Shiraishi, Takumi Ueno, 1991, Other Conferences.

Acid-breakable-resin-based chemical amplification positive resist for 0.1-μm-rule reticle fabrication: design and lithographic performance

Tadashi Arai, Toshio Sakamizu, Kei Kasuya, 2001, Photomask Japan.

Development of electron beam resists based on amorphous polyphenols with low molecular weight and narrow dispersion

Atsuko Yamaguchi, Tadashi Arai, Daiju Shiono, 2005, SPIE Advanced Lithography.

ArF negative resist system using androsterone structure with δ-hydroxy acid for 100-nm phase shifting lithography

Takashi Hattori, Yoshiyuki Yokoyama, Hiroshi Shiraishi, 2001, SPIE Advanced Lithography.

Novel Chemical Amplification System in Azide/Phenolic Resin-Based Negative Resist

Nobuaki Hayashi, Hiroshi Shiraishi, Michiaki Hashimoto, 1989, Advanced Lithography.

Active Filter System Composed of Inverter Bypass Circuit for Suppression of Harmonic Resonance

Ikeda Haruo, Ikuo Kawaguchi, Yoshiya Ogihara, 1993 .

Chemical-amplification positive-resist design for 0.18-μm reticle fabrication using the 50-kV HL-800M electron-beam system

Morihisa Hoga, Tadashi Arai, Takashi Soga, 1998, Photomask and Next Generation Lithography Mask Technology.

PRISM: Process for resist profile improvement with surface modification

Fumio Murai, Shinji Okazaki, Hiroshi Shiraishi, 1988 .

Iodinated polystyrene: An ion‐millable negative resist

Yoshio Taniguchi, Hiroshi Shiraishi, Saburo Nonogaki, 1980 .

Nanometer-Scale Imaging Characteristics of Novolak Resin-Based Chemical Amplification Negative Resist Systems and Molecular-Weight Distribution Effects of the Resin Matrix

Shinji Okazaki, Toshio Sakamizu, Hiroshi Shiraishi, 1994 .

Suppression of Acid Diffusion in Chemical Amplification Resists by Molecular Control of Base Matrix Polymers

Shinji Okazaki, Hiroshi Shiraishi, Toshiyuki Yoshimura, 1995 .

Dissolution Inhibition of Phenolic Resins by Diazonaphthoquinone: Effect of Polymer Structure

Takashi Hattori, Nobuaki Hayashi, Hiroshi Shiraishi, 1991 .

ARCOR, a new photolithography technique with antireflective coating on resist

Norio Hasegawa, Shinji Okazaki, Hiroshi Shiraishi, 1992 .

Effects of Molecular-Weight Distributions of Resist Polymers and Process Control on Lithography for 0.1μm and Below

Tsuneo Terasawa, Shinji Okazaki, Hiroshi Shiraishi, 1997 .

Nano edge roughness in polymer resist patterns

Shinji Okazaki, Hiroshi Shiraishi, Toshiyuki Yoshimura, 1993 .

Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists

Atsuko Yamaguchi, Daiju Shiono, Hiroshi Fukuda, 2005 .

Polyphenol-Based Positive-Tone EB Resist-Resist Shade Mask-

Takashi Hattori, Hiroshi Fukuda, Hiroshi Shiraishi, 2004 .

Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers

Shinji Okazaki, Hiroshi Shiraishi, Toshiyuki Yoshimura, 1993 .

Photochemistry of azide‐phenolic resin photoresists

Hiroshi Shiraishi, Takao Iwayanagi, Michiaki Hashimoto, 1986 .

Acid‐diffusion suppression in chemical amplification resists by controlling acid‐diffusion channels in base matrix polymers

Tsuneo Terasawa, Shinji Okazaki, Hiroshi Shiraishi, 1996 .

New Aqueous-base Soluble Resin and Its Application to Negative and Positive Tone EB resists for Mask-making

Takashi Hattori, Hiroshi Fukuda, Hiroshi Shiraishi, 2004 .

Novolac Based Positive Electron Beam Resist Containing a Polymeric Dissolution Inhibitor: Preparation and Exposure Characteristics

Fumio Murai, Hiroshi Shiraishi, Saburo Nonogaki, 1984 .

Acid-Catalyzed Reactions of Tetrahydropyranyl-Protected Polyvinylphenol in a Novolak-Resin-Based Positive Resist

Nobuaki Hayashi, Toshio Sakamizu, Hiroshi Shiraishi, 1992 .