K. Douki

发表

Lithographic Patterning with Block Copolymers

C. Ober, Mingqi Li, Xuefa Li, 2003 .

Tailoring Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of Hexafluoroisopropyl Alcohol to Photoresist Backbones

H. Koerner, W. Conley, C. Ober, 2002 .

Synthesis and spectroscopic and electrical properties of [W(C3S5)3]2- and [Mo(C3S5)3]2- anion complexes and their oxidized species and x-ray crystal structures of [NBun4]2[W(C3S5)3], [NBun4]2[Mo(C3S5)3], and [Fe(C5Me5)2][W(C3S5)3]

M. Nakano, G. Matsubayashi, W. Mori, 1993 .

X-Ray Molecular Structure of [NBun4]2[Mo(C3S5)3] and Electrical Conductivities of the Oxidized Species

G. Matsubayashi, H. Tamura, K. Douki, 1992 .

Spectroscopic and electrical properties of the [W(C3Se5)3]2− anion complex (C3Se52− = 1,3-diselenole-2-selone-4,5-diselenolate) and the oxidized species

G. Matsubayashi, K. Douki, 1995 .

Spatially Controlled Fabrication of Nanoporous Block Copolymers

C. Ober, Mingqi Li, C. Coenjarts, 2004 .

Additive‐Driven Phase‐Selective Chemistry in Block Copolymer Thin Films: The Convergence of Top–Down and Bottom–Up Approaches

C. Ober, S. Gruner, Detlef-Matthias Smilgies, 2004 .

Highly transparent resist platforms for 157-nm microlithography: an update

Will Conley, Paul Zimmerman, Katsuji Douki, 2002, SPIE Advanced Lithography.

Fluoropolymer resists for 157 nm lithography

Paul Zimmerman, Christopher K. Ober, Daniel Miller, 2002, SPIE Advanced Lithography.

Rejuvenation of 248nm Resist Backbones for 157nm Lithography

H. Koerner, W. Conley, C. Ober, 2001 .

Rejuvenation of 248 nm resist backbones for 157 nm lithography.

Junyan Dai, Will Conley, Daniel Miller, 2001 .

New Strategies for High Resolution Photoresists

P. Zimmerman, W. Conley, C. Ober, 2002 .