R. Matero

发表

In Situ Quadrupole Mass Spectrometry and Quartz Crystal Microbalance Studies on the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetrachloride and Water

M. Ritala, R. Matero, and Antti Rahtu, 2001 .

Atomic layer deposition of ZrO2 thin films using a new alkoxide precursor

M. Ritala, M. Leskelä, P. Williams, 2002 .

Effect of water dose on the atomic layer deposition rate of oxide thin films

Mikko Ritala, Timo Sajavaara, Antti Rahtu, 2000 .

Introducing atomic layer epitaxy for the deposition of optical thin films

M. Ritala, M. Leskelä, R. Matero, 1996 .

In situ reaction mechanism studies on the atomic layer deposition of Al2O3 from (CH3)2AlCl and water.

M. Ritala, A. Rahtu, R. Matero, 2005, Langmuir : the ACS journal of surfaces and colloids.

Demonstration of Phase Change Memories devices using Ge2Sb2Te5 films deposited by Atomic Layer Deposition

A. Toffoli, S. Maitrejean, L. Perniola, 2011, 2011 IEEE International Interconnect Technology Conference.

Influence of atomic layer deposition parameters on the phase content of Ta2O5 films

K. Kukli, M. Ritala, M. Leskelä, 2000 .

Low temperature deposition of AIN films by an alternate supply of trimethyl aluminum and ammonia

M. Ritala, M. Leskelä, J. Jokinen, 1996 .

Effect of LiF addition on the formation of the superconducting YBa2Cu4O8 phase

M. Leskelä, M. Karppinen, L. Niinistö, 1995 .

Studies on the Surface Reactions of Substituted Disilanes with Silica Surface

S. Haukka, A. Root, T. Blomberg, 2008 .

Atomic layer deposited thin films for corrosion protection

Olof Forsén, Mikko Ritala, Jari Aromaa, 1999 .

Evaluation of New Aminoalkoxide Precursors for Atomic Layer Deposition. Growth of Zirconium Dioxide Thin Films and Reaction Mechanism Studies

M. Ritala, M. Leskelä, T. Sajavaara, 2004 .