Masaru Sasago

An Advanced KrF Excimer Laser Stepper For Production Of 16MDRAMs

Masayuki Endo, Hideo Nakagawa, Masaru Sasago, 1988, Advanced Lithography.

Dissolution-rate analysis of ArF resist polymers based on the percolation model

Atsuko Yamaguchi, Seiichi Tagawa, Takeshi Ohfuji, 1998, Advanced Lithography.

Dry etching resistance of methacrylate polymers for ArF excimer laser lithography

Takeshi Ohfuji, Masayuki Endo, Makoto Takahashi, 1998, Advanced Lithography.

Prospects and challenges of ArF excimer laser lithography

Masaru Sasago, 1997, Photomask and Next Generation Lithography Mask Technology.

Novel strategy for the design of highly transparent ArF resists with excellent dry etch resistance

Seiichi Tagawa, Takeshi Ohfuji, Masaru Sasago, 1998, Advanced Lithography.

Resist cluster formation model and development simulation

Atsuko Yamaguchi, Seiichi Tagawa, Takeshi Ohfuji, 1998, Advanced Lithography.

Acid amplification of chemically amplified resists for 193-nm lithography

Hiroshi Ohtsuka, Takeshi Ohfuji, Makoto Takahashi, 1997, Advanced Lithography.

Theoretical calculations of silylation reaction of photoresists

Takeshi Ohfuji, Masayuki Endo, Nobuyuki Matsuzawa, 1998, Advanced Lithography.