Ralf Schuster

Sub 0.2 /spl mu/m lithography on 300 mm wafer

Thorsten Schedel, John Maltabes, Dietmar Ganz, 2000, Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130).

Is lithography ready for 300 mm

Thorsten Schedel, John Maltabes, Dietmar Ganz, 2000 .

Hierarchical edge detector using the first- and second-derivative operators

Nirwan Ansari, Ali R. Bani-Hashemi, Ralf Schuster, 1992, Other Conferences.

Process performance comparisons on 300-mm i-line steppers, DUV stepper, and DUV scanners

Thorsten Schedel, Sebastian Schmidt, John G. Maltabes, 2000, Advanced Lithography.

The effect of non-linear errors on 300mm wafer overlay performance

Thorsten Schedel, John Maltabes, Dietmar Ganz, 2000 .

Effect of nonlinear errors on 300-mm wafer overlay performance

Thorsten Schedel, John Maltabes, Dietmar Ganz, 2000, Advanced Lithography.

Evaluation techniques for 300-mm equipment

Thomas Morgenstern, Karl E. Mautz, Ralf Schuster, 2000, SPIE Advanced Lithography.

Evaluation techniques for 300mm equipment

Thomas Morgenstern, Karl E. Mautz, Ralf Schuster, 2000 .

A process for the production of motor vehicles

Lutz Müller, Christian Meyer, Ralf Schuster, 2008 .

Procedures for an assembly line for motor vehicles

Christian Meyer, Lutz Müller, Ralf Schuster, 2008 .

Overlay considerations for 300-mm lithography

Wolfram Koestler, Ralf Schuster, Markus Veldkamp, 2003, SPIE Advanced Lithography.