Kazuo Tomita

Dispersing of the Loading Filler and Pigment by Eirich Intensive Mixer

Kazuo Tomita, 2008 .

ALargeScale, Flip-Flop RAM imitating alogic LSI forfast development ofprocess technology

H. Makino, Miho Yokota, Tomohiro Tanaka, 2007 .

Eliminating Metal‐Sputter Contamination in Ion Implanter for Low‐Temperature‐Annealed, Low‐Reverse‐Bias‐Current Junctions

Tadashi Shibata, Tadahiro Ohmi, Takahisa Nitta, 1995 .

Ultra-low contact resistance metallization by a silicidation technology employing a silicon capping layer for protection against contamination

Tadahiro Ohmi, Kazuo Tomita, K. Yamada, 1994, Proceedings of 1994 VLSI Technology Symposium.