W. B. Shieh

Automated Defect Severity Analysis for Binary and PSM Mask Defects

Brian Chu, Lynn Cai, Jiunn-Hung Chen, 2002, Photomask Technology.

A simulation-based defect disposition flow for incoming mask quality assurance

Brian Chu, Ray Morgan, Jiunn-Hung Chen, 2005, SPIE Photomask Technology.

Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET

Maciej W. Rudzinski, Kong Son, Lantian Wang, 2004, SPIE Advanced Lithography.

Impact and characterization of mask repair on wafer CD uniformity

Johnson Liu, David Wang, Brian Chu, 2001, SPIE Advanced Lithography.