Laertis Economikos

Hotspot detection and design recommendation using silicon calibrated CMP model

Xiang Hua, Song Li, Vikas Mehrotra, 2009, Advanced Lithography.

Comprehensive BEOL control using scatterometry and APC

Alok Vaid, Prasad Dasari, Padraig Timoney, 2015, Advanced Lithography.

Precision integrated thickness control with gas cluster ion beam etch

Rich Wise, R. Dasaka, Laertis Economikos, 2014, Advanced Lithography.

Understanding, modeling, and detecting pooling hotspots in copper CMP

Laertis Economikos, Stephen Greco, Tamba Gbondo-Tugbawa, 2012, Thirteenth International Symposium on Quality Electronic Design (ISQED).

Using CMP Model for 45nm/32nm BEOL Process and Design Evaluations

Laertis Economikos, Gerald Matusiewicz, Jerry Bao, 2010 .

Toward full-field measurements of instantaneous visualizations of coherent structures in turbulent shear flows

Laertis Economikos, Craig L. Shoemaker, Robert S. Brodkey, 1990 .

Image processing and analysis of colored particle motions in turbulent flow

Laertis Economikos, 1988 .

Integrated metrology's role in Gas Cluster Ion Beam etch

Charles Kang, Naren Yellai, Laertis Economikos, 2015, 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).