Tamba Gbondo-Tugbawa

Hotspot detection and design recommendation using silicon calibrated CMP model

Xiang Hua, Song Li, Vikas Mehrotra, 2009, Advanced Lithography.

In-design DFM CMP flow for block level simulation using 32nm CMP model

Naya Ha, Jinwoo Lee, Kee Sup Kim, 2011, Advanced Lithography.

Hotspot detection and removal flow using multi-level silicon-calibrated CMP models

Sang-Min Han, Yongfu Li, Brian Lee, 2016, SPIE Advanced Lithography.

Model-based CMP aware RC extraction of interconnects in 16nm designs

Eunjoo Choi, Yongchan Ban, Sang Min Han, 2016, SPIE Advanced Lithography.

Characterization of shallow trench isolation CMP process and its application

Hua Ding, Flora Li, Yang-Chih Chiu, 2016, SPIE Advanced Lithography.

Chip-scale modeling of pattern dependencies in copper chemical mechanical polishing processes

Tamba Gbondo-Tugbawa, Tamba Gbondo-Tugbawa, 2002 .

Understanding, modeling, and detecting pooling hotspots in copper CMP

Laertis Economikos, Stephen Greco, Tamba Gbondo-Tugbawa, 2012, Thirteenth International Symposium on Quality Electronic Design (ISQED).