John N. Randall

发表

Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process

Michael L. Rieger, Alexander V. Tritchkov, Shane R. Palmer, 2001, SPIE Photomask Technology.

Parallel assembly of microsystems using Si micro electro mechanical systems

George D. Skidmore, Aaron Geisberger, John N. Randall, 2003 .

Some challenges for mask making to keep up with the roadmap

Kurt G. Ronse, Thomas Marschner, Rik Jonckheere, 1998, Photomask Technology.

Sub-resolution feature OPC as an enabler for manufacturing at 0.2mm and below

Patrick Jaenen, K. Ronse, A. Tritchkov, 1998 .

Stability analysis of a Scanning Tunneling Microscope control system

S. O. Reza Moheimani, John N. Randall, Farid Tajaddodianfar, 2017, 2017 American Control Conference (ACC).

Advances in mask fabrication and alignment for masked ion-beam lithography

John C. Wolfe, John N. Randall, David P. Stumbo, 1990, Advanced Lithography.

Masked Ion Beam Lithography Using Stencil Masks

N. P. Economou, John N. Randall, Dale C. Flanders, 1984, Advanced Lithography.

Process capability analysis of DUV alternating PSM and DUV attenuated PSM lithography for 100-nm gate fabrication

Keeho Kim, Won D. Kim, Mark E. Mason, 2000, Advanced Lithography.

Realizing Complex Microsystems: A Deterministic Parallel Assembly Approach

George D. Skidmore, Aaron Geisberger, John N. Randall, 2004 .

Reduction of mask-induced CD errors by optical proximity correction

Patrick Jaenen, Kurt G. Ronse, Rik Jonckheere, 1998, Advanced Lithography.

Potential nanoelectronic integrated circuit technologies

John N. Randall, Gary A. Frazier, Alan Seabaugh, 1996 .

Metrology applications of scanning probe microscopes

John N. Randall, Francis G. Celii, Leigh Ann Files-Sesler, 1993, Other Conferences.

Mask error factor impact on the 130-nm node

Keeho Kim, Mark E. Mason, John N. Randall, 2000, Advanced Lithography.

OPC on real-world circuitry

Mark E. Mason, John N. Randall, Tom Aton, 2003, SPIE Advanced Lithography.

Scanning Tunneling Microscope Control: A Self-Tuning PI Controller Based on Online Local Barrier Height Estimation*

S. O. Reza Moheimani, John N. Randall, Farid Tajaddodianfar, 2019, IEEE Transactions on Control Systems Technology.

Advances in the processing of quantum-coupled devices

Thomas M. Moore, Yung-Chung Kao, John N. Randall, 1990, Other Conferences.

Digital atomic scale fabrication an inverse Moore's Law – A path to atomically precise manufacturing

John N. Randall, Ehud Fuchs, Erik J. Henriksen, 2018, Micro and Nano Engineering.

Lithography simulation with aerial image - Variable threshold resist model

Alexander Tritchkov, John N. Randall, Hareen Gangala, 1999 .

Ion projection: the successor to optical lithography

Lloyd R. Harriott, Robert W. Hill, Walter Finkelstein, 1994, Advanced Lithography.

A self-tuning controller for high-performance scanning tunneling microscopy

S. O. Reza Moheimani, John N. Randall, Farid Tajaddodianfar, 2017, 2017 IEEE Conference on Control Technology and Applications (CCTA).

The nanotech impact on IC processing: near and long term

Richard E. Stallcup, John N. Randall, Taylor Cavanah, 2006, SPIE Advanced Lithography.

Proceedings of the third international conference on on Low dimensional structures & devices

Marc Van Rossum, John N. Randall, M. Henini, 2000 .

Room-temperature resonant tunnelling bipolar transistor XNOR and XOR integrated circuits

E. A. Beam, John N. Randall, Alan Seabaugh, 1993 .

Manufacturability of 248-nm phase-shift lithography for 100-nm transistors

Keeho Kim, Mark E. Mason, John N. Randall, 2000, Advanced Lithography.

Manufacturability of 248nm phase shift lithography for 100nm transistors

Keeho Kim, Mark E. Mason, John N. Randall, 2000 .

Advances in stencil mask technology: control of distortion in ion-projection lithography masks

Robert D. Mohondro, Hans Loeschner, John C. Wolfe, 1995, Photomask Technology.

Atomic precision lithography on Si

John N. Randall, Scott W. Schmucker, Joseph W. Lyding, 2009 .

Nitrocellulose as a positive or negative self‐developing resist

N. P. Economou, John N. Randall, Michael W. Geis, 1985 .

Fabrication of lateral resonant tunneling devices with heterostructure barriers

Dejan Jovanovic, John N. Randall, Alan Seabaugh, 1996 .

Nanoelectronics: Fanciful physics or real devices?

Mark A. Reed, John N. Randall, Gary A. Frazier, 1989 .

Realization of pseudomorphic and superlattice bipolar resonant tunneling transistors

Mark A. Reed, John N. Randall, William R. Frensley, 1988, Technical Digest., International Electron Devices Meeting.

High resolution ion beam lithography at large gaps using stencil masks

N. P. Economou, John N. Randall, Dale C. Flanders, 1983 .

Pattern transfer of hydrogen depassivation lithography patterns into silicon with atomically traceable placement and size control

Kai Li, Robert M. Wallace, Richard M. Silver, 2014 .

Realization of a three-terminal resonant tunneling device: The bipolar quantum resonant tunneling transistor

Mark A. Reed, John N. Randall, William R. Frensley, 1989 .

Optically induced mask critical dimension error magnification in 248 nm lithography

Alexander Tritchkov, John N. Randall, 1998 .

Atomic precision patterning on Si: An opportunity for a digitized process

John N. Randall, Scott W. Schmucker, Joseph W. Lyding, 2010 .

A proximity ion beam lithography process for high density nanostructures

R. C. Tiberio, W. E. Horne, Mark D. Morgan, 1996 .

Fabrication of micromechanical switches for routing radio frequency signals

John N. Randall, David Denniston, Chuck Goldsmith, 1996 .

Theoretical Analysis of Diamond Mechanosynthesis . Part III . Positional C 2 Deposition on Diamond C ( 110 ) Surface Using Si / Ge / Sn-Based Dimer Placement Tools

George D. Skidmore, Robert A. Freitas, Jingping Peng, 2005 .

Novel electrostatic column for ion projection lithography

R. W. Hill, Lloyd R. Harriott, Ka-Ngo Leung, 1994 .

Theoretical Analysis of Diamond Mechanosynthesis. Part III. Positional C 2 Deposition on Diamond C(110) Surfac eUsin gSi/Ge/Sn-Base dDime rPlacemen tTools

George D. Skidmore, Robert A. Freitas, Jingping Peng, 2006 .

Nanoelectronic circuits using resonant tunneling transistors and diodes

John N. Randall, Gary A. Frazier, Alan Seabaugh, 1993, 1993 IEEE International Solid-State Circuits Conference Digest of Technical Papers.

Fabrication of closely spaced quantum dot diodes

Yung-Chung Kao, Mark A. Reed, John N. Randall, 1990 .

Scanning tunneling microscopy: Critical dimension and surface roughness analysis

John N. Randall, David Harkness, Leigh Ann Files‐Sesler, 1991 .

The contrast of ion beam stencil masks

John N. Randall, J. P. Donnelly, L. A. Stern, 1986 .

Magnetically enhanced reactive ion etching of silicon in bromine plasmas

John C. Wolfe, John N. Randall, J. Randall, 1988 .

Quantum-well resonant-tunneling transistors

Mark A. Reed, John N. Randall, William R. Frensley, 1989, Proceedings., IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits,.

Microfabricated Silicon Mechanical Connectors and Micro Assembly

George D. Skidmore, Aaron Geisberger, John N. Randall, 2002 .