John P. Stirniman

Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process

Michael L. Rieger, Alexander V. Tritchkov, Shane R. Palmer, 2001, SPIE Photomask Technology.

Understanding the parameters for strong phase-shift mask lithography

Alexander Tritchkov, Michael L. Rieger, John P. Stirniman, 2000, Advanced Lithography.

Optical proximity effects correction at 0.25 um incorporating process variations in lithography

Geert Vandenberghe, Kurt G. Ronse, Luc Van den Hove, 1997, Advanced Lithography.

Alternating PSM optimization using model-based OPC

Alexander Tritchkov, Michael L. Rieger, John P. Stirniman, 1999, Advanced Lithography.