George G. Barclay

发表

Mechanistic understanding of post-etch roughness in 193-nm photoresists

James W. Thackeray, Young Cheol Bae, George G. Barclay, 2003, SPIE Advanced Lithography.

Blob defect prevention in 193nm topcoat-free immersion lithography

George G. Barclay, Deyan Wang, Jinrong Liu, 2012, Other Conferences.

Design and performance of photoresist materials for ArF lithography

James W. Thackeray, George G. Barclay, Robert J. Kavanagh, 2001, SPIE Advanced Lithography.

Developer effect on the negative tone development process under low NILS conditions

Young Cheol Bae, George G. Barclay, Seung-Hyun Lee, 2011, Advanced Lithography.

Methacrylate resists and antireflective coatings for 193-nm lithography

George G. Barclay, Robert J. Kavanagh, Peter Trefonas, 1999, Advanced Lithography.

Practical resists for 193-nm lithography using 2.38% TMAH: physicochemical influences on resist performance

George G. Barclay, Robert J. Kavanagh, Peter Trefonas, 1997, Advanced Lithography.

Investigation of lithographic performance for 120-nm and sub-120-nm gate applications of advanced ArF resists based on VEMA co-polymers

James W. Thackeray, George G. Barclay, Robert J. Kavanagh, 2002, SPIE Advanced Lithography.

Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone

Joo-Tae Moon, George G. Barclay, Robert J. Kavanagh, 2001, SPIE Advanced Lithography.

Novel embedded barrier layer materials for ArF non-topcoat immersion applications

George G. Barclay, Deyan Wang, Peter Trefonas, 2008, Lithography Asia.

Subnanometer wavelength metrology of lithographically prepraed structures: a comparison of neutron and X-ray scattering.

Wen-li Wu, George G. Barclay, Patrick J. Bolton, 2003, SPIE Advanced Lithography.

Narrow polydispersity polymers for microlithography: synthesis and properties

Roger F. Sinta, Hiroshi Ito, George G. Barclay, 1996, Advanced Lithography.

Advanced immersion contact hole patterning for sub 40nm memory applications: a fundamental resist study

Seong-Woon Choi, Woo-Sung Han, George G. Barclay, 2009, Advanced Lithography.

New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices

Will Conley, Gregory Breyta, William R. Brunsvold, 1997, Advanced Lithography.

Why do weak acids not work in 193-nm photoresists?: matrix effects on acid-catalyzed deprotection

George G. Barclay, Gerd Pohlers, James F. Cameron, 2004, SPIE Advanced Lithography.

Manipulation of the thermal properties of positive DUV polymers

Roger F. Sinta, George G. Barclay, David R. Medeiros, 1996, Advanced Lithography.

Advanced patterning solutions based on double exposure: double patterning and beyond

Michael T. Reilly, Young Cheol Bae, George G. Barclay, 2009, Lithography Asia.

Understanding dissolution behavior of 193nm photoresists in organic solvent developers

George G. Barclay, Seung-Hyun Lee, Cecily Andes, 2012, Other Conferences.

Materials for single-etch double patterning process: surface curing agent and thermal cure resist

Yi Liu, George G. Barclay, Peter Trefonas, 2009, Advanced Lithography.

Implementation of the ArF resists based on VEMA for sub-100-nm device

Joo-Tae Moon, George G. Barclay, Robert J. Kavanagh, 2002, SPIE Advanced Lithography.

Structural characterizaton of deep-submicron lithographic structures using small-angle neutron scattering

Wen-li Wu, George G. Barclay, Patrick J. Bolton, 2002, SPIE Advanced Lithography.

Advances in vortex via fabrication

Yasutaka Morikawa, Naoya Hayashi, Martin E. Mastovich, 2004, SPIE Advanced Lithography.

Advanced patterning solutions based on the "shrink process assisted by double exposure" (SPADE)

George G. Barclay, Thomas Cardolaccia, Rosemary Bell, 2010, Advanced Lithography.

Evaluating resist degradation during reactive ion oxide etching using 193 nm model resist formulations

George G. Barclay, Claire Sourd, Damien Perret, 2006, SPIE Advanced Lithography.

Negative tone 193-nm photoresists

Michael T. Reilly, George G. Barclay, Patrick J. Bolton, 2003, SPIE Advanced Lithography.

Thermal Stability of Sulfonate Ester Photoacid Generators in Phenolic Matrixes

Roger F. Sinta, George G. Barclay, David R. Medeiros, 1995 .

Design Consideration for Immersion 193: Embedded Barrier Layer and Pattern Collapse Margin

George G. Barclay, Peter Trefonas, Stefan Caporale, 2007 .

Small Angle X-Ray Scattering for Sub-100 nm Pattern Characterization

Wen-li Wu, George G. Barclay, Patrick J. Bolton, 2003 .

Liquid crystalline epoxy thermosets based on dihydroxymethylstilbene: Synthesis and characterization

George G. Barclay, Christopher K. Ober, Konstantinos I. Papathomas, 1992 .

The “Living” Free Radical Synthesis of Poly(4-hydroxystyrene): Physical Properties and Dissolution Behavior

Hiroshi Ito, Roger F. Sinta, George G. Barclay, 1998 .