Patrick J. Bolton

Mechanistic understanding of post-etch roughness in 193-nm photoresists

James W. Thackeray, Young Cheol Bae, George G. Barclay, 2003, SPIE Advanced Lithography.

Subnanometer wavelength metrology of lithographically prepraed structures: a comparison of neutron and X-ray scattering.

Wen-li Wu, George G. Barclay, Patrick J. Bolton, 2003, SPIE Advanced Lithography.

Structural characterizaton of deep-submicron lithographic structures using small-angle neutron scattering

Wen-li Wu, George G. Barclay, Patrick J. Bolton, 2002, SPIE Advanced Lithography.

Negative tone 193-nm photoresists

Michael T. Reilly, George G. Barclay, Patrick J. Bolton, 2003, SPIE Advanced Lithography.

Small Angle X-Ray Scattering for Sub-100 nm Pattern Characterization

Wen-li Wu, George G. Barclay, Patrick J. Bolton, 2003 .