Nick Pugliano

Mechanistic understanding of post-etch roughness in 193-nm photoresists

James W. Thackeray, Young Cheol Bae, George G. Barclay, 2003, SPIE Advanced Lithography.

Investigation of lithographic performance for 120-nm and sub-120-nm gate applications of advanced ArF resists based on VEMA co-polymers

James W. Thackeray, George G. Barclay, Robert J. Kavanagh, 2002, SPIE Advanced Lithography.

Progress toward the development of manufacturable integrated optical data buses

Nick Pugliano, Garo Khanarian, Matthew L. Moynihan, 2004, SPIE OPTO.

Reflection control for line features of multiple pitches at hyper NA

Michael T. Reilly, Nick Pugliano, Michael Wagner, 2008, SPIE Advanced Lithography.

Progress toward board-level optical interconnect technology

Nick Pugliano, Hai Bin Zheng, Matthew L. Moynihan, 2005, SPIE OPTO.

Reflection control for immersion lithography at 45/32-nm nodes

Nick Pugliano, Ruei-Hung Hsu, Suzanne Coley, 2008, SPIE Advanced Lithography.

Hybrid inorganic-organic aqueous base compatible waveguide materials for optical interconnect applications

Nick Pugliano, Hai Bin Zheng, Garo Khanarian, 2003, SPIE Optics + Photonics.

Negative tone 193-nm photoresists

Michael T. Reilly, George G. Barclay, Patrick J. Bolton, 2003, SPIE Advanced Lithography.