Richard M. Ness

Timing and synchronization of solid state pulsed power modules (SSPPM) for excimer laser applications

Richard M. Ness, Paul C. Melcher, Robert B. Saethre, 2002, Conference Record of the Twenty-Fifth International Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop..

XLA-300: the fourth-generation ArF MOPA light source for immersion lithography

Toshihiko Ishihara, Robert A. Bergstedt, Richard M. Ness, 2006, SPIE Advanced Lithography.

A computerized system for the acquisition and alaysis of spark gap breakdown voltage data

Richard M. Ness, 1983 .

Performance and scaling of a dense plasma focus light source for EUV lithography

Igor V. Fomenkov, Oleh V. Khodykin, Richard M. Ness, 2003, SPIE Advanced Lithography.

Performance and scaling of a dense plasma focus light source for EUV lithography

Igor V. Fomenkov, Oleh V. Khodykin, Richard M. Ness, 2004, SPIE Advanced Lithography.

Comparison of ArF and KrF laser performance at 2 kHz for microlithography

Vladimir B. Fleurov, Richard M. Ness, Paul C. Melcher, 2000, Advanced Lithography.

Dense Plasma Focus Source

Igor V. Fomenkov, William N. Partlo, Richard M. Ness, 2006 .

Timing compensation for an excimer laser solid-state pulsed power module (SSPPM)

Richard M. Ness, D. Johns, B. Smith, 2000 .

Performance characterization for an excimer laser solid-state pulsed power module (SSPPM) after 20B shots

Richard M. Ness, Daniel L. Birx, W. N. Partlo, 2000 .

EUV discharge light source based on a dense plasma focus operated with positive and negative polarity

Igor V. Fomenkov, William N. Partlo, Oleh V. Khodykin, 2004 .

Evaluation of nanocrystalline materials, amorphous metal alloys, and ferrites for magnetic pulse compression applications

R. Burdt, Richard M. Ness, Chaofeng Huang, 2006 .