Tomas Nyberg

发表

Serial magnetron co-sputtering: Sputtering yield amplification and process modelling

Matthias Wuttig, Andreas Pflug, Sören Berg, 2011 .

Tribochemically active Ti-C-S coatings

Staffan Jacobson, Ulf Jansson, Harald Nyberg, 2013 .

Advances in Heuristic and Monte-Carlo Simulation of Reactive Sputtering and Technical Application

Andreas Pflug, Tomas Nyberg, Sittinger, 2004 .

Control of reactive sputtering process using two reactive gases

Sören Berg, Tomas Nyberg, D. J. Christie, 2003 .

High rate reactive magnetron sputter deposition of titanium oxide

Sören Berg, Tomas Kubart, Tomas Nyberg, 2008 .

A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination

Koen Strijckmans, Sören Berg, Tomas Nyberg, 2013 .

Dynamic Behaviour of the Reactive Sputtering Process

Sören Berg, Tomas Kubart, Tomas Nyberg, 2006 .

Experiments and modeling of dual reactive magnetron sputtering using two reactive gases

Sören Berg, Tomas Kubart, Tomas Nyberg, 2008 .

Influence of the target composition on reactively sputtered titanium oxide films

Jens Jensen, Sören Berg, Tomas Kubart, 2009 .

Dynamic simulations of pulsed reactive sputtering processes

Sören Berg, Tomas Nyberg, S. Berg, 2000 .

Upgrading the “Berg-model” for reactive sputtering processes

Sören Berg, Tomas Nyberg, Erik Särhammar, 2014 .