Anna Tchikoulaeva

ACLV degradation: root cause analysis and effective monitoring strategy

Anna Tchikoulaeva, Andre Holfeld, Markus Arend, 2008, Photomask Japan.

Reticle process monitoring and qualification based on reticle CDU and wafer CDU correlation

Christian Holfeld, Byoung Il Choi, Sia Kim Tan, 2011, Photomask Technology.

Integration of EUV lithography in the fabrication of 22-nm node devices

John Arnold, Sudhar Raghunathan, Yunfei Deng, 2009, Advanced Lithography.

High MEEF reticle inspection strategy

Remo Kirsch, Anna Tchikoulaeva, Stephanie Winkelmeier, 2009, Photomask Technology.

Productivity improvement through automated operation of reticle defect inspection tools in a wafer fab environment

Heiko Wagner, Yulin Zhang, Shinichi Tanabe, 2013, Advanced Lithography.

Printability and detection of backside defects on photomasks

Martin Sczyrba, Andre Holfeld, Christian Holfeld, 2011, Photomask Technology.

The use of EUV lithography to produce demonstration devices

John Arnold, Harry J. Levinson, Sander Bouten, 2008, SPIE Advanced Lithography.

An investigation of EUV lithography defectivity

Yunfei Deng, Youri van Dommelen, Bruno La Fontaine, 2008, Photomask Technology.