Laurent Souqui

Plasma CVD of B-C-N Thin Films Using Triethylboron in Argon-Nitrogen Plasma

J. Palisaitis, H. Högberg, H. Pedersen, 2020, Journal of Materials Chemistry C.

Gas Phase Chemistry of Trimethylboron in Thermal Chemical Vapor Deposition

R. Hall-Wilton, C. Höglund, J. Birch, 2017 .

Surface-Inhibiting Effect in Chemical Vapor Deposition of Boron–Carbon Thin Films from Trimethylboron

H. Högberg, H. Pedersen, Laurent Souqui, 2019, Chemistry of Materials.

Scaling of elongation transition thickness during thin-film growth on weakly interacting substrates

K. Sarakinos, B. Lü, Laurent Souqui, 2017 .

Rhombohedral and turbostratic boron nitride: X-ray diffraction and photoluminescence signatures

P. Valvin, B. Gil, G. Cassabois, 2021, Applied Physics Letters.

Using metal precursors to passivate oxides for area selective deposition

J. Abelson, G. Girolami, Laurent Souqui, 2023, Journal of Vacuum Science & Technology A.

Texture evolution in rhombohedral boron carbide films grown on 4H-SiC(0001̄) and 4H-SiC(0001) substrates by chemical vapor deposition.

Sachin Sharma, H. Högberg, H. Pedersen, 2022, Dalton transactions.