I. Zyulkov

发表

Selective electroless deposition of cobalt using amino-terminated SAMs

K. Opsomer, C. Detavernier, S. De Gendt, 2019, Journal of Materials Chemistry C.

Use of high order precursors for manufacturing gate all around devices

Naoto Horiguchi, Liesbeth Witters, Andriy Hikavyy, 2017 .

Selective Ru ALD as a Catalyst for Sub-Seven-Nanometer Bottom-Up Metal Interconnects.

S. De Gendt, S. Armini, M. Krishtab, 2017, ACS applied materials & interfaces.

Area-selective ALD of Ru on nm-scale Cu lines through dimerization of amino-functionalized alkoxy silane passivation films.

S. De Gendt, R. O'Connor, M. Snelgrove, 2020, ACS applied materials & interfaces.