Yoon-Hae Kim

Passivation effect on low-k SiOC dielectrics by H2 plasma treatment

Y. H. Lee, H. Kim, J. Y. Kim, 2002 .

Deposition and Characterization of PECVD SiOC Films by Using Bistrimethylsilylmethane (BTMSM) Precursor

M. S. Hwang, Y. H. Lee, H. Kim, 2001 .

Infrared spectroscopy study of low-dielectric-constant fluorine-incorporated and carbon-incorporated silicon oxide films

M. S. Hwang, Y. H. Lee, J. Y. Kim, 2001 .

Low-k Si–O–C–H composite films prepared by plasma-enhanced chemical vapor deposition using bis-trimethylsilylmethane precursor

Yoon-Hae Kim, S. W. Lee, H. J. Kim, 2000 .

Structural characterization of porous low-k SiOC thin films using x-ray porosimetry

B. Bauer, Wen-Li Wu, H. Kim, 2002, Proceedings of the IEEE 2002 International Interconnect Technology Conference (Cat. No.02EX519).

Origin of low dielectric constant of carbon-incorporated silicon oxide film deposited by plasma enhanced chemical vapor deposition

M. S. Hwang, Y. H. Lee, J. Y. Kim, 2001 .

Strain dependence of the electronic properties of LaTiO3 thin films

S. J. Moon, Yoon-Hae Kim, S. Moon, 2014 .