A. Matsushita

Low damage ashing using H/sub 2//He plasma for porous ultra low-k

N. Ohashi, H. Shin, S. Sone, 2003, Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695).

Silicon fine structure formation on sapphire with focused ion beam

H. Nakashima, H. Mori, A. Kenjo, 1998, 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144).

Deep states in silicon on sapphire by transient-current spectroscopy

Akiyoshi Baba, Hiroshi Nakashima, Taizoh Sadoh, 1997 .