Y. Inoue

Local‐Oxidation‐Induced Stress Measured by Raman Microprobe Spectroscopy

Y. Akasaka, T. Nishimura, M. Hirayama, 1990 .

An SOI-DRAM with wide operating voltage range by CMOS/SIMOX technology

T. Eimori, Y. Inoue, T. Iwamatsu, 1994, IEEE International Solid-State Circuits Conference.

Three dimensional IC for high performance image signal processor

Y. Horiba, T. Nishimura, M. Nakaya, 1987, 1987 International Electron Devices Meeting.

CAD-compatible high-speed CMOS/SIMOX gate array using field-shield isolation

T. Iwamatsu, Yasuo Inoue, N. Tsubouchi, 1995 .