Hiroaki Fujishima

Standard developer available ArF resist and performance

Yasunori Uetani, Hiroaki Fujishima, Yoshiko Miya, 1998, Advanced Lithography.

Investigation of cyclopolymerization for ArF positive photoresist

Kazuhiko Hashimoto, Yasunori Uetani, Hiroaki Fujishima, 2003, SPIE Advanced Lithography.

Positive ArF resist with 2EAdMA/GBLMA resin system

Hiroaki Fujishima, Ichiki Takemoto, Yasunori Uetani, 1999, Advanced Lithography.

Comparison of acrylate and methacrylate resin system in ArF lithography

Hiroaki Fujishima, Yasunori Uetani, 2000, Advanced Lithography.