Karl Kragler

Ion projection lithography (IPL): posters presented at the 5th Intrnational SEMATECH Next-Generation Lithography (NGL) workshop

Hans Loeschner, Patrick W. de Jager, Andreas Wolter, 2002, European Mask and Lithography Conference.

Resist technologies for ion projection lithography (IPL) stencil maskmaking

Joerg Butschke, Mathias Irmscher, Florian Letzkus, 2000, Advanced Lithography.

Progress in placement control for ion beam stencil mask technology

Joerg Butschke, Thomas Struck, Ernst Haugeneder, 2001, SPIE Advanced Lithography.

Progress in placement control for ion beam stencil mask technology

Joerg Butschke, Thomas Struck, Martin Kratzenberg, 2001, European Mask and Lithography Conference.