Raja Muthinti

An OCD perspective of line edge and line width roughness metrology

Jeffrey Shearer, Ravi Bonam, Raja Muthinti, 2017, Advanced Lithography.

Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)

Nelson Felix, Raja Muthinti, Cornel Bozdog, 2016, SPIE Advanced Lithography.

Advanced in-line metrology strategy for self-aligned quadruple patterning

Nelson Felix, Raja Muthinti, Mary Breton, 2016, SPIE Advanced Lithography.

Comprehensive analysis of line-edge and line-width roughness for EUV lithography

Jeffrey Shearer, Ravi Bonam, Raja Muthinti, 2017, Advanced Lithography.