Uwe D. Zeitner

Schwarzschild-objective-based EUV micro-exposure tool

Tino Benkenstein, Torsten Feigl, Norbert Kaiser, 2006, SPIE Advanced Lithography.

Modeling of Free-Space Microoptics

Peter Schreiber, Wolfgang Karthe, Uwe D. Zeitner, 2004 .

Double-sided hybrid micro-optical elements combining functions of multistage optical systems

Peter Dannberg, Uwe D. Zeitner, 2001, SPIE Optics + Photonics.

Photomask displacement technology for continuous profile generation by mask aligner lithography

Tina Weichelt, Uwe D. Zeitner, Robert Kinder, 2016 .

Efficient fabrication of complex nano-optical structures by E-beam lithography based on character projection

Torsten Harzendorf, Ernst-Bernhard Kley, Holger Schmidt, 2014, Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.