Jonathan H. Ma
发表
Han Wang,
Patrick Naulleau,
David Prendergast,
2020,
Journal of Micro/Nanolithography, MEMS, and MOEMS.
Han Wang,
Patrick Naulleau,
David Prendergast,
2019,
Photomask Technology.
Han Wang,
Patrick Naulleau,
David Prendergast,
2020,
Advanced Lithography.
Stephen R. Leone,
Alexander Hexemer,
Jonathan H. Ma,
2014,
Science.
Jonathan H. Ma,
Holt P. Bui,
C. Rettner,
2021
.
Jonathan H. Ma,
A. Bostwick,
C. Jozwiak,
2020,
Physical Review B.
Jonathan H. Ma,
D. Graf,
J. Denlinger,
2021,
npj Quantum Materials.
Jonathan H. Ma,
D. Graf,
J. Denlinger,
2020,
npj Quantum Materials.
Jonathan H. Ma,
H. Eisaki,
A. Lanzara,
2018,
1804.07750.
Huth,
Jonathan H. Ma,
Petrus,
2015
.
Jonathan H. Ma,
S. Carron,
S. Marchesini,
2022,
The Journal of chemical physics.
Craig D. Needham,
Jonathan H. Ma,
A. Neureuther,
2022,
ACS applied materials & interfaces.
Jonathan H. Ma,
Holt P. Bui,
C. Rettner,
2021,
ACS applied materials & interfaces.
Patrick P. Naulleau,
Andrew R. Neureuther,
Jonathan H. Ma,
2019,
Extreme Ultraviolet (EUV) Lithography X.