Andrew Neureuther

Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations

Han Wang, Patrick Naulleau, David Prendergast, 2020, Journal of Micro/Nanolithography, MEMS, and MOEMS.

Measuring the Phase of EUV Photomasks

Laura Waller, Patrick Naulleau, Andrew Neureuther, 2019, Photomask Technology.

Stray-light sources from pupil mask edges and mitigation techniques for the TPF Coronagraph

Jeremy Kasdin, Marshall Miller, Andrew Neureuther, 2006, SPIE Astronomical Telescopes + Instrumentation.

Characterizing edge-generated stray light sources for TPF Coronagraph pupil masks

Jeremy Kasdin, Andrew Neureuther, Daniel Ceperley, 2005, SPIE Optics + Photonics.

Quantitative phase retrieval for EUV photomasks

Laura Waller, Patrick Naulleau, Ryan Miyakawa, 2020, Advanced Lithography.

Investigating EUV radiation chemistry with first principle quantum chemistry calculations

Han Wang, Patrick Naulleau, David Prendergast, 2019, Photomask Technology.

Excitation selectivity in model tin-oxo resist: a computational chemistry perspective

Han Wang, Patrick Naulleau, David Prendergast, 2020, Advanced Lithography.