Hiroyoshi Ando

The study of high-speed electron beam deflection technology for VSB writers

Junji Hirumi, Nobuyuki Yoshioka, Hiromichi Hoshi, 2004, Photomask Japan.

EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond

Kenichi Saito, Hiroyoshi Ando, Takashi Kamikubo, 2011, Photomask Technology.

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Kenichi Saito, Hiroyoshi Ando, Takashi Kamikubo, 2014, Photomask Technology.

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Hiroyoshi Ando, Takashi Kamikubo, Jun Yashima, 2014, Photomask and Next Generation Lithography Mask Technology.

Active noise cancellation technique for highly accurate EB lithography systems

Hiroyoshi Ando, Teruo Iwasaki, Norio Saitou, 1997, Advanced Lithography.