Vincent Vachellerie

Complete Imageless solution for overlay front-end manufacturing

Marco Polli, David Herisson, Virginie LeCacheux, 2005 .

Overlay measurement accuracy verification using CD-SEM and application to the quantification of WIS caused by BARC

Philippe Thony, Elyakim Kassel, Marco Polli, 2005, SPIE Advanced Lithography.

Overlay metrology results on leading-edge Cu processes

Ganesh Sundaram, Pascal Fabre, Pierre-Olivier Sassoulas, 2002, SPIE Advanced Lithography.

Productivity enhancements in recipe creation for overlay metrology measurements

Ganesh Sundaram, Vincent Vachellerie, Paul C. Knutrud, 2002, SPIE Advanced Lithography.

Evaluation of wet-developable KrF organic BARC to improve CD uniformity for implant application

Jean-Damien Chapon, Stephanie Kremer, Vincent Vachellerie, 2004, SPIE Advanced Lithography.

Gate Spacer Width Monitoring Study with Scatterometry Based on Spectroscopic Ellipsometry

Vincent Vachellerie, N. Bicais, Stephanie Kremer, 2005 .