Weijie Shi

Gradient-based source mask and polarization optimization with the hybrid Hopkins–Abbe model

Linglin Zhu, Ming Ding, Zhiyuan Niu, 2020 .

Prediction of lens heating induced aberration via particle filter in optical lithography

Sikun Li, Xiangzhao Wang, Lifeng Duan, 2018, Advanced Lithography.

An excellent performance optical system for freeform pupil illumination module in immersion photolithography machine

Aijun Zeng, Huijie Huang, Fang Zhang, 2018, Other Conferences.

A parallel thinning method based on image marking

Rongchun Zhao, Jinchang Ren, Dagan Feng, 1998, ICSP '98. 1998 Fourth International Conference on Signal Processing (Cat. No.98TH8344).

Flexible pupil correction technology for photolithography machine

Aijun Zeng, Huijie Huang, Fang Zhang, 2018, Other Conferences.

Enlarge the process window of patterns in 22nm node by using mask topography aware OPC and SMO

Yayi Wei, Xiaojing Su, Zhiyang Song, 2015, 2015 China Semiconductor Technology International Conference.

Amperometric biosensor based on immobilized acetylcholinesterase on gold nanoparticles and silk fibroin modified platinum electrode for detection of methyl paraoxon, carbofuran and phoxim

Jing Xu, Weijie Shi, Huanshun Yin, 2009 .

Amperometric determination of bisphenol A in milk using PAMAM-Fe3O4 modified glassy carbon electrode

Weijie Shi, Huanshun Yin, S. Ai, 2011 .