Yeon Hee Kim

Magnetic properties of La–Sr–Mn–O/Si thin film as a function of RF magnetron power and O2 partial pressure

B. Lee, C. Kim, S. Park, 2000 .

Effect of various pulse plasma techniques on TiO2 etching for metalens formation

Hee Ju Kim, J. Hong, H. Tak, 2023, Vacuum.

Etched characteristics of nanoscale TiO2 using C4F8-based and BCl3-based gases

D. W. Kim, Hee Ju Kim, J. Hong, 2023, Materials Science in Semiconductor Processing.