Paul Mertens

Use of a Purged FOUP to Improve H-Terminated Silicon Surface Stability Prior to Epitaxial Growth

Stefan De Gendt, Roger Loo, Andriy Hikavyy, 2014 .

Optimizing high frequency ultrasound cleaning in the semiconductor industry

Stefan De Gendt, Marc Hauptmann, Herbert Struyf, 2012, CAV 2012.

(Invited) Selective Etch of Si and SiGe for Gate All-Around Device Architecture

Naoto Horiguchi, Liesbeth Witters, Aaron Thean, 2015 .

Impact of Acoustical Reflections on Megasonic Cleaning Performance

Sandip Halder, Marc Hauptmann, Paul Mertens, 2009 .

Investigating the role of gas cavitation in megasonic nanoparticle removal

Els Parton, M. Schmidt, Guy Vereecke, 2004, MICRO 2004.

Oxygen Control Challenge for Advanced Wet Processing

Hiroaki Uchida, Farid Sebaai, Hiromitsu Takahashi, 2015 .

Cleaning Challenges and Solutions for Advanced Technology Nodes

Hiroaki Takahashi, Diana Tsvetanova, Paul Mertens, 2011 .