Young-Sam Yoo

Adhesion force change on multilayer EUVL mask due to laser induced plasma shock wave

A. Busnaina, Jinho Ahn, Jin-Goo Park, 2009 .

Damage Free Particle Removal from Extreme Ultraviolet Lithography Mask Layers by High Energy Laser Shock Wave Cleaning

Ahmed Busnaina, Jinho Ahn, Jin-Goo Park, 2008 .

Effects of size, humidity, and aging on particle removal from Si wafers

Seung-Ho Lee, Jin-Goo Park, Tae-Gon Kim, 2009 .