V. Jindal

Modeling the EUV multilayer deposition process on EUV blanks

Jenah Harris-Jones, V. Jindal, P. Kearney, 2011, Advanced Lithography.

SEMATECH's infrastructure for defect metrology and failure analysis to support its EUV mask defect reduction program

V. Jindal, J. Harris-Jones, C. C. Lin, 2011, Advanced Lithography.

Ion beam deposition system for depositing low defect density extreme ultraviolet mask blanks

V. Jindal, P. Kearney, R. Teki, 2012, Advanced Lithography.

Challenges in EUV mask blank deposition for high volume manufacturing

A. Antohe, Frank Goodwin, V. Jindal, 2013, Advanced Lithography.